发明授权
- 专利标题: Electron beam apparatus
- 专利标题(中): 电子束装置
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申请号: US11331111申请日: 2006-01-13
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公开(公告)号: US07427826B2公开(公告)日: 2008-09-23
- 发明人: Jun Iba , Yasuo Ohashi , Hisanobu Azuma , Takahiro Hachisu , Masanori Takahashi
- 申请人: Jun Iba , Yasuo Ohashi , Hisanobu Azuma , Takahiro Hachisu , Masanori Takahashi
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 代理机构: Fitzpatrick, Cella, Harper & Scinto
- 优先权: JP2005-016629 20050125; JP2005-016630 20050125
- 主分类号: H01J1/00
- IPC分类号: H01J1/00 ; H01J9/02
摘要:
There provided is an electron beam apparatus of preventing surface creeping discharge from newly arising due to discharge that arises between an anode electrode and an electron-emitting device. In an electron-emitting device including a scan signal device electrode and an information signal device electrode, a portion of the scan signal device electrode is covered by an insulating layer of insulating scan signal wiring from information signal wiring, an additional electrode is connected to the scan signal device electrode at an end portion of the insulating layer and the additional electrode is configured so that energy Ee being lost due to melting of the additional electrode is larger than energy Ea of discharge current flowing in to the electron-emitting device.
公开/授权文献
- US20060164001A1 Electron beam apparatus 公开/授权日:2006-07-27
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