发明授权
- 专利标题: Electrostatic discharge protection circuit protecting thin gate insulation layers in a semiconductor device
- 专利标题(中): 静电放电保护电路保护半导体器件中的薄栅绝缘层
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申请号: US11648328申请日: 2006-12-29
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公开(公告)号: US07430099B2公开(公告)日: 2008-09-30
- 发明人: Kook Whee Kwak , Nak Heon Choi
- 申请人: Kook Whee Kwak , Nak Heon Choi
- 申请人地址: KR Kyoungki-do
- 专利权人: Hynix Semiconductor Inc.
- 当前专利权人: Hynix Semiconductor Inc.
- 当前专利权人地址: KR Kyoungki-do
- 代理机构: Ladas & Parry LLP
- 优先权: KR10-2005-0134953 20051230
- 主分类号: H02H9/00
- IPC分类号: H02H9/00
摘要:
An electrostatic discharge protection circuit protects the internal circuits of a semiconductor. The electrostatic discharge protection circuit includes a first electrostatic protection unit connected to a power source supply pad. The first electrostatic protection unit discharges an ESD current into the power source supply pad when an ESD is introduced into the input/output pad, and generates a first driving voltage by utilizing the ESD current flow through a voltage-drop unit. A driver driven by the first driving voltage generates a second driving voltage by an ESD current. A second electrostatic protection unit discharges the introduced ESD current into the power source supply pad by the second driving voltage such that a voltage applied to a gate of the first NMOS transistor is reduced.
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