发明授权
US07432035B2 (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
有权
（甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法
- 专利标题： (Meth)acrylate derivative, polymer and photoresist composition having lactone structure, and method for forming pattern by using it
- 专利标题（中）： （甲基）丙烯酸酯衍生物，具有内酯结构的聚合物和光致抗蚀剂组合物，以及通过使用其形成图案的方法
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申请号： US11713791申请日： 2007-03-05
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公开(公告)号： US07432035B2公开(公告)日： 2008-10-07
- 发明人: Katsumi Maeda , Shigeyuki Iwasa , Kaichiro Nakano , Etsuo Hasegawa
- 申请人： Katsumi Maeda , Shigeyuki Iwasa , Kaichiro Nakano , Etsuo Hasegawa
- 申请人地址： JP Tokyo
- 专利权人： NEC Corporation
- 当前专利权人： NEC Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Foley & Lardner LLP
- 优先权： JP1998/188853 19980703; JP1998/328491 19981118
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; G03F7/004
摘要：
There are here disclosed a photoresist material for lithography using a light of 220 nm or less which comprises at least a polymer represented by the following formula (2) and a photo-acid generator for generating an acid by exposure: wherein R1, R2, R3 and R5 are each a hydrogen atom or a methyl group; R4 is an acid-labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has an acid labile group, an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group, or a hydrocarbon group having 3 to 13 carbon atoms, which has an epoxy group; R6 is a hydrogen atom, a hydrocarbon group having 1 to 12 carbon atoms, or an alicyclic hydrocarbon group having 7 to 13 carbon atoms, which has a carboxyl group; x, y and z are optional values which meet x+y+z=1, 0
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