Invention Grant
- Patent Title: Body biasing structure of SOI
- Patent Title (中): SOI的主体偏置结构
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Application No.: US11423696Application Date: 2006-06-12
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Publication No.: US07432552B2Publication Date: 2008-10-07
- Inventor: Byung-Gook Park , Tae-Hoon Kim , II-Han Park
- Applicant: Byung-Gook Park , Tae-Hoon Kim , II-Han Park
- Applicant Address: KR Seoul KR Suwon-si
- Assignee: Seoul National University Industry Foundation,Samsung Electronics Co., Ltd.
- Current Assignee: Seoul National University Industry Foundation,Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Seoul KR Suwon-si
- Agency: Marger Johnson & McCollom PC
- Priority: KR10-2005-0050107 20050611
- Main IPC: H01L27/01
- IPC: H01L27/01

Abstract:
A body biasing structure of devices connected in series on an SOI substrate is provided. According to some embodiments, the shallow junction of common source/drain regions enables all devices to bias by only one body contact on an SOI substrate like a conventional bulk MOSFET, and the floating body effect on an SOI substrate can be prevented.
Public/Granted literature
- US20060278927A1 BODY BIASING STRUCTURE OF SOI Public/Granted day:2006-12-14
Information query
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