Invention Grant
- Patent Title: Antenna device with ion-implanted resonant pattern
- Patent Title (中): 具有离子注入谐振图案的天线装置
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Application No.: US11404812Application Date: 2006-04-17
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Publication No.: US07432866B2Publication Date: 2008-10-07
- Inventor: Yu-Chiang Cheng , Ping-Cheng Chang , Cheng-Zing Chou
- Applicant: Yu-Chiang Cheng , Ping-Cheng Chang , Cheng-Zing Chou
- Applicant Address: TW Hsin-Chu Hsien
- Assignee: Mitac Technology Corp.
- Current Assignee: Mitac Technology Corp.
- Current Assignee Address: TW Hsin-Chu Hsien
- Agency: Rosenberg, Klein & Lee
- Priority: TW95108651A 20060314
- Main IPC: H01Q1/38
- IPC: H01Q1/38 ; H01Q21/00

Abstract:
Disclosed is an antenna device having a substrate, an antenna element for transceiving a wireless signal, an antenna signal feeding line for feeding the wireless signal, and an ion-implanted resonant pattern, which includes a first coupling pattern implanted in the substrate by an Ion-implantation process and a second coupling pattern formed at a position corresponding to the first coupling pattern with a predetermined distance therebetween, formed at an adjacent position with respect to the antenna element. As the antenna element transceives the wireless signal of the predetermined radiation frequency and generates an induction voltage, the first coupling pattern and the second coupling pattern each generates a coupled induction voltage and a capacitance therebetween, hence forming a resonance with the antenna element.
Public/Granted literature
- US20070216581A1 Antenna device with ion-implanted resonant pattern Public/Granted day:2007-09-20
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