发明授权
- 专利标题: Charged particle beam equipment and charged particle microscopy
- 专利标题(中): 带电粒子束设备和带电粒子显微镜
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申请号: US11302323申请日: 2005-12-14
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公开(公告)号: US07435957B2公开(公告)日: 2008-10-14
- 发明人: Hiromi Inada , Mitsugu Sato , Atsushi Takane
- 申请人: Hiromi Inada , Mitsugu Sato , Atsushi Takane
- 申请人地址: JP Tokyo
- 专利权人: Hitachi High-Technologies Corporation
- 当前专利权人: Hitachi High-Technologies Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: McDermott Will & Emery LLP
- 优先权: JP2004-366607 20041217
- 主分类号: G01N23/00
- IPC分类号: G01N23/00
摘要:
On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.
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