Invention Grant
- Patent Title: Optical element and method for forming domain inversion regions
- Patent Title (中): 用于形成畴反转区域的光学元件和方法
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Application No.: US10593866Application Date: 2005-03-15
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Publication No.: US07440161B2Publication Date: 2008-10-21
- Inventor: Akihiro Morikawa , Tomoya Sugita , Kiminori Mizuuchi
- Applicant: Akihiro Morikawa , Tomoya Sugita , Kiminori Mizuuchi
- Applicant Address: JP Osaka
- Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee: Matsushita Electric Industrial Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Wenderoth, Lind & Ponack, L.L.P.
- Priority: JP2004-086230 20040324
- International Application: PCT/JP2005/004520 WO 20050315
- International Announcement: WO2005/091066 WO 20050929
- Main IPC: G02F1/35
- IPC: G02F1/35
Abstract:
There is provided a stable optical element having a fine, uniform, and wide-ranging domain inversion structure in a ferroelectric crystal. This includes a plurality of domain inversions (101) formed on an MgO:LiNbO3 substrate (100), and a groove (102) formed on the substrate surface between the domain inversions (101). The depth T′ of substantially all of the domain inversions (101) satisfies the relation T′
Public/Granted literature
- US20070216990A1 Optical Element And Method For Forming Domain Inversion Regions Public/Granted day:2007-09-20
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