发明授权
- 专利标题: Defect inspection apparatus, defect inspection method and program
- 专利标题(中): 缺陷检查装置,缺陷检查方法和程序
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申请号: US10657107申请日: 2003-09-09
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公开(公告)号: US07440605B2公开(公告)日: 2008-10-21
- 发明人: Yasushi Sasa , Hiroyuki Onishi
- 申请人: Yasushi Sasa , Hiroyuki Onishi
- 申请人地址: JP Kyoto
- 专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人: Dainippon Screen Mfg. Co., Ltd.
- 当前专利权人地址: JP Kyoto
- 代理机构: McDermott Will & Emery LLP
- 优先权: JPP2002-294851 20021008
- 主分类号: G06K9/00
- IPC分类号: G06K9/00
摘要:
A reference image and an inspection image indicating pattern on a substrate are acquired and a specified pixel value range (63) is set on the basis of a histogram (62a) of pixel values of the reference image. Then, a transfer curve (71) having a large inclination in the specified pixel value range (63) is obtained. The inspection image and the reference image are converted in accordance with an LUT having transfer characteristics indicated by the transfer curve (71), an enhanced differential image between a converted inspection image and a converted reference image is generated and each pixel value of the enhanced differential image is compared with a predetermined threshold value, to thereby perform a detection of defective pixel. With this, a value of pixel in the enhanced differential image which corresponds to a pixel in the reference image (or inspection image) having the pixel value in the specified pixel value range (63) is enhanced, and appropriate inspection is thereby performed.