Invention Grant
- Patent Title: Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
- Patent Title (中): 在晶片衬底上沉积,释放和封装微机电器件的方法
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Application No.: US11093927Application Date: 2005-03-29
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Publication No.: US07449358B2Publication Date: 2008-11-11
- Inventor: Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
- Applicant: Satyadev R. Patel , Andrew G. Huibers , Steve S. Chiang
- Applicant Address: US TX Dallas
- Assignee: Texas Instruments Incorporated
- Current Assignee: Texas Instruments Incorporated
- Current Assignee Address: US TX Dallas
- Agent W. James Brady, III; Frederick J. Telecky, Jr.
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for forming a MEMS device is disclosed, where a final release step is performed just prior to a wafer bonding step to protect the MEMS device from contamination, physical contact, or other deleterious external events. Without additional changes to the MEMS structure between release and wafer bonding and singulation, except for an optional stiction treatment, the MEMS device is best protected and overall process flow is improved. The method is applicable to the production of any MEMS device and is particularly beneficial in the making of fragile micromirrors.
Public/Granted literature
- US20050170614A1 Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates Public/Granted day:2005-08-04
Information query
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