发明授权
- 专利标题： Detecting apparatus and device manufacturing method
- 专利标题（中）： 检测装置和装置制造方法
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申请号： US11435128申请日： 2006-05-17
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公开(公告)号： US07449691B2公开(公告)日： 2008-11-11
- 发明人: Masahiro Hatakeyama , Takeshi Murakami , Tohru Satake , Nobuharu Noji , Ichirota Nagahama , Yuichiro Yamazaki
- 申请人： Masahiro Hatakeyama , Takeshi Murakami , Tohru Satake , Nobuharu Noji , Ichirota Nagahama , Yuichiro Yamazaki
- 申请人地址： JP Tokyo JP Tokyo
- 专利权人： Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人： Ebara Corporation,Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo JP Tokyo
- 代理机构： Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权： JP273432/2001 20010910
- 主分类号： G01N23/00
- IPC分类号： G01N23/00
摘要：
A detecting apparatus for detecting a fine geometry on a surface of a sample, wherein an irradiation beam is irradiated against the sample placed in a different environment different from an atmosphere and a secondary radiation emanated from the sample is detected by a sensor, and wherein the sensor is disposed at an inside of the different environment, a processing device to process detection signals from the sensor is disposed at an outside of the different environment, and a transmission means transmits detection signals from the sensor to the processing device.
公开/授权文献
- US20060219909A1 Detecting apparatus and device manufacturing method 公开/授权日：2006-10-05
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