发明授权
- 专利标题： Method of manufacturing substrate for ink jet recording head and method of manufacturing recording head using substrate manufactured by this method
- 专利标题（中）： 喷墨记录头用基板的制造方法以及使用该方法制造的基板的记录头的制造方法
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申请号： US11118404申请日： 2005-05-02
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公开(公告)号： US07452474B2公开(公告)日： 2008-11-18
- 发明人: Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
- 申请人： Hirokazu Komuro , Teruo Ozaki , Shuji Koyama , Kousuke Kubo , Makoto Terui , Kazuhiro Hayakawa , Ryoji Kanri , Masataka Kato
- 申请人地址： JP Tokyo
- 专利权人： Canon Kabushiki Kaisha
- 当前专利权人： Canon Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Fitzpatrick, Cella, Harper & Scinto
- 优先权： JP2004-137510 20040506; JP2005-106287 20050401
- 主分类号： G01D15/00
- IPC分类号： G01D15/00
摘要：
In order to form a more homogenous heat generating resistive layer, the present invention provides a method of manufacturing a substrate for an ink jet recording head having a support which has an insulative layer on its surface, a pair of electrode layers disposed on the surface of the support, and a heat generating resistive layer which continuously covers the pair of electrode layers and a section between the pair of electrode layers. The method includes the step of forming an electrode layer on the support and the step of forming the pair of electrode layers by etching the electrode layer. In the step of forming the pair of electrode layers by etching the electrode layer, by etching a surface portion of the insulative layer positioned between the pair of insulative layers, a recess is formed in the surface portion of the insulative layer.
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