发明授权
US07453645B2 Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
有权
光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件
- 专利标题： Spectral purity filter, lithographic apparatus including such a spectral purity filter, device manufacturing method, and device manufactured thereby
- 专利标题（中）： 光谱纯度滤光片，包括这种光谱纯度滤光片的光刻设备，器件制造方法以及由此制造的器件
-
申请号： US11025601申请日： 2004-12-30
-
公开(公告)号： US07453645B2公开(公告)日： 2008-11-18
- 发明人: Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人： Derk Jan Wilfred Klunder , Maarten Marinus Johannes Wilhelmus Van Herpen
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman, LLP
- 主分类号： G02B27/14
- IPC分类号： G02B27/14 ; G02B3/00 ; G02B27/10
摘要：
A spectral purity filter includes an aperture, the aperture having a diameter, wherein the spectral purity filter is configured to enhance the spectral purity of a radiation beam by reflecting radiation of a first wavelength and allowing at least a portion of radiation of a second wavelength to transmit through the aperture, the first wavelength being larger than the second wavelength. The spectral purity filter may be used to improve the spectral purity of an Extreme Ultra-Violet (EUV) radiation beam.
公开/授权文献
信息查询
