发明授权
- 专利标题: Calibrating multiple photoelectron spectroscopy systems
- 专利标题(中): 校准多个光电子能谱系统
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申请号: US11395189申请日: 2006-03-30
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公开(公告)号: US07456399B1公开(公告)日: 2008-11-25
- 发明人: Eric J. Soderstrom
- 申请人: Eric J. Soderstrom
- 申请人地址: US CA Sunnyvale
- 专利权人: ReVera Incorporated
- 当前专利权人: ReVera Incorporated
- 当前专利权人地址: US CA Sunnyvale
- 代理机构: Blakely, Sokoloff, Taylor & Zafman LLP
- 主分类号: H01J40/00
- IPC分类号: H01J40/00 ; H01J47/00
摘要:
A method comprising obtaining a first set of spectral data for a first sample film measured by a first system, extracting intensities for one or more elemental species associated with the first sample film to provide a first set of extracted intensities using a function, and determining a first quantitative characteristic associated with the first sample film using the first set of extracted intensities. Next, obtain a second set of spectral data measured for a comparable sample film measured by a second photoelectron spectroscopy system. Next, apply the same function and continually adjust the function to extract intensities for the respective elemental species associated with the comparable sample film to provide a second set of corrected-extracted intensities. A second quantitative characteristic for the comparable sample is determined. The function is continually adjusted until the determined second quantitative characteristic closely or substantially matches the first quantitative characteristic.
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