发明授权
US07456439B1 Vertical thyristor-based memory with trench isolation and its method of fabrication
失效
具有沟槽隔离的垂直基于晶闸管的存储器及其制造方法
- 专利标题: Vertical thyristor-based memory with trench isolation and its method of fabrication
- 专利标题(中): 具有沟槽隔离的垂直基于晶闸管的存储器及其制造方法
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申请号: US10884337申请日: 2004-07-01
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公开(公告)号: US07456439B1公开(公告)日: 2008-11-25
- 发明人: Andrew E. Horch
- 申请人: Andrew E. Horch
- 申请人地址: US CA Milpitas
- 专利权人: T-RAM Semiconductor, Inc.
- 当前专利权人: T-RAM Semiconductor, Inc.
- 当前专利权人地址: US CA Milpitas
- 代理机构: Fields IP, PS
- 主分类号: H01L29/74
- IPC分类号: H01L29/74
摘要:
A semiconductor device may comprise a plurality of memory cells. A memory cell may comprise a thyristor, at least a portion of which is formed in a pillar of semiconductor material. The pillar may comprise sidewalls defining a cylindrical circumference of a first diameter. In a particular embodiment, the pillars associated with the plurality of memory cells may define rows and columns of an array. In a further embodiment, a pillar may be spaced by a first distance of magnitude up to the first diameter relative to a neighboring pillar within its row. In an additional further embodiment, the pillar may be spaced by a second distance of a magnitude up to twice the first diameter, relative to a neighboring pillar within its column.
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