发明授权
- 专利标题: Apparatus for and method of measuring composition and pressure of the discharged gas from ion gauge using residual gas analyzer
- 专利标题(中): 使用残留气体分析仪测量离子计排出气体的组成和压力的装置和方法
-
申请号: US11551708申请日: 2006-10-21
-
公开(公告)号: US07456633B2公开(公告)日: 2008-11-25
- 发明人: Seung Soo Hong , Kwang Hwa Chung , Yong Hyeon Shin
- 申请人: Seung Soo Hong , Kwang Hwa Chung , Yong Hyeon Shin
- 申请人地址: KR Daejeon
- 专利权人: Korean Research Institute of Standards and Science
- 当前专利权人: Korean Research Institute of Standards and Science
- 当前专利权人地址: KR Daejeon
- 代理机构: DeMont & Breyer LLC
- 优先权: KR10-2006-0079797 20060823
- 主分类号: G01L21/30
- IPC分类号: G01L21/30 ; G01N27/62
摘要:
Disclosed herein are an apparatus for and method of measuring the composition and the pressure of the discharged gas from an ion gauge by using a residual gas analyzer. In this regard, there are provided a vacuum container 200 divided into a pressure container 210 and a discharge container 220 by means of a partition 235 having an orifice 230 formed thereon; an ion gauge 100 mounted at the pressure container 210 side of the vacuum container 200 for discharging the gas at the time of vacuum formation; a residual gas analyzer 240 mounted at the pressure container 210 side of the vacuum container 200 for measuring the composition and the pressure of the residual gas; pump means disposed at one side of the discharge container 220 of the vacuum container 200 for discharging the inside gas; and heating means disposed at the vacuum container 200 for heating the vacuum container 200 to a predetermined temperature.
公开/授权文献
信息查询