Invention Grant
US07462659B2 Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
有权
反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
- Patent Title: Reactive cyclodextrin derivatives as pore-forming templates, and low dielectric materials prepared by using the same
- Patent Title (中): 反应性环糊精衍生物作为成孔模板,以及使用其制备的低介电材料
-
Application No.: US10588358Application Date: 2004-12-14
-
Publication No.: US07462659B2Publication Date: 2008-12-09
- Inventor: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , Se Jung Park , Jae-Jin Shin
- Applicant: Hee-Woo Rhee , Do Young Yoon , Kook Heon Char , Jin-Kyu Lee , Bongjin Moon , Sung-Kyu Min , Se Jung Park , Jae-Jin Shin
- Applicant Address: KR Seoul
- Assignee: Industry - University Cooperation Foundation Sogang University
- Current Assignee: Industry - University Cooperation Foundation Sogang University
- Current Assignee Address: KR Seoul
- Agency: Frommer Lawrence & Haug LLP
- Agent Ronald R. Santucci
- Priority: KR10-2004-0010827 20040218
- International Application: PCT/KR2004/003287 WO 20041214
- International Announcement: WO2005/078743 WO 20050825
- Main IPC: C08J3/00
- IPC: C08J3/00

Abstract:
This invention is related to a reactive nanoparticular cyclodextrin derivative useful as a porogen and a low dielectric matrix, with excellent mechanical properties and uniformly distributed nanopores, manufactured by sol-gel reaction of the above reactive cyclodextrin. Furthermore, this invention also is related to an ultralow dielectric film, with uniformly distributed nanopores, a relatively high porosity of 51%, and a relatively low dielectric constant of 1.6, manufactured by thin-filming of the conventional organic or inorganic silicate precursor by using the above reactive nanoparticular cyclodextrin derivative as a porogen.
Public/Granted literature
Information query