发明授权
- 专利标题： Pattern film forming method and pattern film forming apparatus
- 专利标题（中）： 图案成膜方法和图案成膜装置
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申请号： US11034805申请日： 2005-01-14
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公开(公告)号： US07462927B2公开(公告)日： 2008-12-09
- 发明人: Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
- 申请人： Jun Fujinawa , Junji Nakada , Norio Shibata , Takashi Kataoka
- 申请人地址： JP Tokyo
- 专利权人： FUJIFILM Corporation
- 当前专利权人： FUJIFILM Corporation
- 当前专利权人地址： JP Tokyo
- 代理机构： Sughrue Mion, PLLC
- 优先权： JP2004-006800 20040114
- 主分类号： H01L23/02
- IPC分类号： H01L23/02 ; H01L21/00 ; H01L21/20
摘要：
A pattern film forming method includes a step of producing a transfer sheet in which a thin film is formed on a surface of a sheet-shaped material and a step of pressing the thin film against a pattern film formation surface of the substrate with a pressing member having convex portions corresponding to the pattern film from a reverse surface of the transfer sheet opposite to the thin film or a reverse surface of the substrate opposite to the pattern film formation surface to transfer the thin film to the substrate. A pattern film forming apparatus includes a sheet supply device, a pressing device and a substrate transport device. A high-definition pattern film having a desired pattern and a sharp edge can be formed with high productivity.
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