发明授权
- 专利标题： Projection objective having a high aperture and a planar end surface
- 专利标题（中）： 具有高孔径和平坦端面的投射物镜
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申请号： US11151465申请日： 2005-06-14
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公开(公告)号： US07466489B2公开(公告)日： 2008-12-16
- 发明人: Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
- 申请人： Susanne Beder , Wolfgang Singer , Karl-Heinz Schuster
- 代理机构： Sughrue Mion, PLLC
- 优先权： DE102004051730 20041022
- 主分类号： G02B3/00
- IPC分类号： G02B3/00 ; G03B27/42
摘要：
A projection objective for imaging a pattern provided in an object plane of the projection objective onto an image plane of the projection objective suitable for microlithography projection exposure machines has a plurality of optical elements transparent for radiation at an operating wavelength of the projection objective. At least one optical element is a high-index optical element made from a high-index material with a refractive index n≧1.6 at the operating wavelength.