发明授权
- 专利标题: Liquid jetting apparatus and liquid jetting method
- 专利标题(中): 液体喷射装置和液体喷射方法
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申请号: US11081810申请日: 2005-03-17
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公开(公告)号: US07467835B2公开(公告)日: 2008-12-23
- 发明人: Yue Gao , Katsuhiro Okubo
- 申请人: Yue Gao , Katsuhiro Okubo
- 申请人地址: JP Tokyo
- 专利权人: Seiko Epson Corporation
- 当前专利权人: Seiko Epson Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Sughrue Mion, PLLC
- 优先权: JP2004-076891 20040317; JP2004-085586 20040323
- 主分类号: B41J25/308
- IPC分类号: B41J25/308 ; B41J29/393
摘要:
A liquid jetting apparatus and a liquid jetting method are achieved that can prevent unexpected landing position displacement relating to satellite droplets. For example, the liquid jetting apparatus includes a head in which a nozzle row constituted by a plurality of nozzles lined up in a row is arranged at a medium-opposing surface which is in opposition to a medium, a head movement section that moves the head in a predetermined direction along a surface of the medium, a spacing adjustment section that adjusts a spacing between the head and the medium, and an ejection control section that carries out ejection control of a liquid by determining at least one non-ejection nozzle among a plurality of nozzles sandwiched between a nozzle at one end of the nozzle row and a nozzle at another end thereof, the non-ejection nozzle being a nozzle which is caused not to eject liquid, the number of the non-ejection nozzle being determined according to a spacing from the medium-opposing surface to the surface of the medium.
公开/授权文献
- US20050270317A1 Liquid jetting apparatus and liquid jetting method 公开/授权日:2005-12-08
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