发明授权
- 专利标题: Method of producing an ultra thin electrically conducting film with very low electrical resistance
- 专利标题(中): 制造具有非常低电阻的超薄导电膜的方法
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申请号: US10659187申请日: 2003-09-10
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公开(公告)号: US07468557B2公开(公告)日: 2008-12-23
- 发明人: Klaus Schroder
- 申请人: Klaus Schroder
- 申请人地址: US NY Syracuse
- 专利权人: Syracuse University
- 当前专利权人: Syracuse University
- 当前专利权人地址: US NY Syracuse
- 代理机构: Pastel Law Firm
- 代理商 Christopher R. Pastel
- 主分类号: H01L23/48
- IPC分类号: H01L23/48
摘要:
An ultra thin film with very low electrical resistance is produced by forming a substrate of a substrate material which forms a metastable bond and depositing a conducting film on the substrate in a vacuum environment in which a base pressure is reduced to a value below 10−5 Torr. The film is a metal, metallic alloy, or multilayered film which includes at least one metallic layer. A 0.1 nm thick manganese film deposited in this way on a germanium substrate has a resistivity which at room temperature is lower than the resistivity of metal films of aluminum and copper with the same thickness prepared the same way.