发明授权
- 专利标题： Discharge lamp with a discharge filling having a measured emission intensity of argon to OH radicals and method of manufacturing the same
- 专利标题（中）： 具有测量的发射强度为氩至OH自由基的放电填充物的放电灯及其制造方法
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申请号： US11391307申请日： 2006-03-29
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公开(公告)号： US07468584B2公开(公告)日： 2008-12-23
- 发明人: Takuya Tsukamoto , Noriko Nishiaki , Yoshihiro Horikawa , Senga Takehito
- 申请人： Takuya Tsukamoto , Noriko Nishiaki , Yoshihiro Horikawa , Senga Takehito
- 申请人地址： JP Tokyo
- 专利权人： Ushiodenki Kabushiki Kaisha
- 当前专利权人： Ushiodenki Kabushiki Kaisha
- 当前专利权人地址： JP Tokyo
- 代理机构： Roberts Mlotkowski Safran & Cole, P.C.
- 代理商 David S. Safran
- 优先权： JP2005-102248 20050331
- 主分类号： H01J9/00
- IPC分类号： H01J9/00 ; H01J9/42 ; H01J61/12 ; H01J61/16
摘要：
Process for producing a discharge lamp having a silica discharge vessel with an emission space in which there is a pair of electrodes at least 0.15 mg/mm3 of mercury, argon (Ar), and halogen by measuring the relation b/a1 between the emission intensity a1 of argon (Ar) at a wavelength of 668 nm and the emission intensity b of OH radicals at a wavelength of 309 nm in a state of glow discharge of the discharge lamp; supplying hydrogen into the discharge vessel of the discharge lamp; measuring the relation c/a2 between the emission intensity a2 of argon (Ar) at a wavelength of 668 nm and the emission intensity c of OH radicals at a wavelength of 309 nm in the state of glow discharge of the discharge lamp; and fixing the difference c/a2−b/a1 at a value in the range of 0.001 to 15.
公开/授权文献
- US20060220562A1 Discharge lamp 公开/授权日：2006-10-05
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