发明授权
US07468795B2 Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same
有权
选择用于校正光刻设备中的网格变形的工艺配方的网格模型和使用其的光刻组件的方法
- 专利标题： Method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus and lithographic assembly using the same
- 专利标题（中）： 选择用于校正光刻设备中的网格变形的工艺配方的网格模型和使用其的光刻组件的方法
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申请号： US11484849申请日： 2006-07-12
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公开(公告)号： US07468795B2公开(公告)日： 2008-12-23
- 发明人: Hubertus Johannes Gertrudus Simons , Henricus Johannes Lambertus Megens , Everhardus Cornelis Mos , Leonardus Henricus Marie Verstappen , Roy Werkman , Henricus Jacobus Maria Verhoeven
- 申请人： Hubertus Johannes Gertrudus Simons , Henricus Johannes Lambertus Megens , Everhardus Cornelis Mos , Leonardus Henricus Marie Verstappen , Roy Werkman , Henricus Jacobus Maria Verhoeven
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G01B11/00
- IPC分类号： G01B11/00
摘要：
A method of selecting a grid model for correcting a process recipe for grid deformations in a lithographic apparatus is disclosed. First a set of grid models is provided. Subsequently, alignment data are obtained by performing an alignment measurement on a plurality of alignment marks on a number of substrates. For each grid model it is checked whether the alignment data is suitable to solve the grid model. If so, the grid model is added to a subset of grid models. The grid model with lowest residuals is selected. In addition to alignment data, metrology data may be obtained by performing an overlay measurement on a plurality of overlay marks on the number of substrates. For each grid model of the subset simulated metrology data may then be determined that is used to determine overlay performance indicators. The grid model is then selected using the overlay performance indicators.