发明授权
- 专利标题: X-ray source provided with a liquid metal target
- 专利标题(中): X射线源设有液态金属靶
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申请号: US10481802申请日: 2002-06-20
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公开(公告)号: US07471769B2公开(公告)日: 2008-12-30
- 发明人: Geoffrey Harding , Bernd David , Rainer Willi Eckart , Jens Peter Schlomka
- 申请人: Geoffrey Harding , Bernd David , Rainer Willi Eckart , Jens Peter Schlomka
- 申请人地址: NL Eindhoven
- 专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人: Koninklijke Philips Electronics N.V.
- 当前专利权人地址: NL Eindhoven
- 优先权: DE10130070 20010621
- 国际申请: PCT/IB02/02374 WO 20020620
- 国际公布: WO03/001556 WO 20030103
- 主分类号: H01J35/08
- IPC分类号: H01J35/08 ; H01J35/00
摘要:
An X-ray source and an X-ray apparatus with an X-ray source are provided, the X-ray source includes a liquid metal target which flows through a system of ducts and is conducted through a duct section which has a flow cross-section that is reduced relative to that of the system of ducts. The X-ray source provides a pressure source for acting on the liquid metal target such that the pressure in the liquid metal target at the area of the reduced flow cross-section equals essentially a selectable reference value or remains essentially in a pressure range between selectable limit values of the pressure. A comparatively small thickness of a window can thus be realized in conjunction with a comparatively high flow speed.
公开/授权文献
- US20040174957A1 X-ray source provided with a liquid metal target 公开/授权日:2004-09-09
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