Invention Grant
- Patent Title: Position measurement system
- Patent Title (中): 位置测量系统
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Application No.: US11206974Application Date: 2005-08-19
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Publication No.: US07474418B2Publication Date: 2009-01-06
- Inventor: Yasuji Seko , Yoshinori Yamaguchi , Hiroyuki Miyake
- Applicant: Yasuji Seko , Yoshinori Yamaguchi , Hiroyuki Miyake
- Applicant Address: JP Tokyo
- Assignee: Fuji Xerox Co., Ltd.
- Current Assignee: Fuji Xerox Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JPP2005-090830 20050328
- Main IPC: G01B11/26
- IPC: G01B11/26

Abstract:
A position measurement system includes a photographing unit and an arithmetic processing unit. The photographing unit has a lens and a light-receiving element. The lens forms an optical ring image from light from a light source through spherical aberration. The light-receiving element detects the optical ring image formed by the lens. The arithmetic processing unit measures a distance to the light source on the basis of the quantity of light of the optical ring image detected by the light-receiving element.
Public/Granted literature
- US20060215178A1 Position measurement system Public/Granted day:2006-09-28
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