发明授权
- 专利标题： Projection exposure apparatus and method for producing a printed circuit board
- 专利标题（中）： 投影曝光装置及印刷电路板的制造方法
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申请号： US11185264申请日： 2005-07-20
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公开(公告)号： US07477354B2公开(公告)日： 2009-01-13
- 发明人: Wataru Nakagawa , Kazunori Hashimoto
- 申请人： Wataru Nakagawa , Kazunori Hashimoto
- 申请人地址： JP Tokyo
- 专利权人： Adtec Engineering Co., Ltd.
- 当前专利权人： Adtec Engineering Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Nields & Lemack
- 优先权： JP2004-256940 20040903
- 主分类号： G03B27/42
- IPC分类号： G03B27/42 ; G03B27/54
摘要：
A projection exposure apparatus and a method for producing a printed circuit board wherein, the whole pattern including pieces 10 and coupons 12 to be exposed on a print circuit board 2 is depicted on a photo mask 1 divided in six areas by divide line 19, the exposure will be made with respect to the each divided area of the photo mask 1 mounted on a movable photo mask stage 5 with using a masking device 3 masking other area than the exposing area.
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