Invention Grant
- Patent Title: Gas sensor
- Patent Title (中): 气体传感器
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Application No.: US10495790Application Date: 2002-11-14
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Publication No.: US07479255B2Publication Date: 2009-01-20
- Inventor: Seiichi Otani , Yukio Nakamura , Mamoru Furusato
- Applicant: Seiichi Otani , Yukio Nakamura , Mamoru Furusato
- Applicant Address: JP Tokyo
- Assignee: Riken Keiki Co., Ltd.
- Current Assignee: Riken Keiki Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Connolly Bove Lodge & Hutz LLP
- Priority: JP2001-350021 20011115; JP2002-295794 20021009; JP2002-295795 20021009
- International Application: PCT/JP02/11875 WO 20021114
- International Announcement: WO03/042678 WO 20030522
- Main IPC: G01N31/12
- IPC: G01N31/12 ; G01N27/16

Abstract:
A hydrogen sensor 25 has a fitting base plate 29 in which a gas-sensing chamber 34 is formed, a specimen gas intake 35 formed on said fitting base plate 29, opening toward an exit passage 24 and introducing hydrogen gas into the gas-sensing chamber 34, a gas-sensing element 39 held in the gas-sensing chamber 34 and adapted to sense hydrogen gas, and a water-repelling filter 44 covering the specimen gas intake 35.
Public/Granted literature
- US20050042141A1 Gas sensor Public/Granted day:2005-02-24
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