发明授权
- 专利标题： Photomask having a monitoring pattern with an asymmetrical diffraction grating that includes semi-transparent probing-phase shifters
- 专利标题（中）： 具有包含半透明探测移相器的不对称衍射光栅的监视图案的光掩模
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申请号： US10927320申请日： 2004-08-27
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公开(公告)号： US07482102B2公开(公告)日： 2009-01-27
- 发明人: Takashi Sato , Takashi Sakamoto
- 申请人： Takashi Sato , Takashi Sakamoto
- 申请人地址： JP Tokyo
- 专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人： Kabushiki Kaisha Toshiba
- 当前专利权人地址： JP Tokyo
- 代理机构： Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- 优先权： JP2003-303479 20030827
- 主分类号： G03F1/00
- IPC分类号： G03F1/00 ; G03F1/14
摘要：
A photomask having a monitoring pattern configured to obtain information required for adjusting an optical system of a projection lithography tool. The monitoring pattern encompasses a mask substrate and an asymmetrical diffraction grating delineated on the mask substrate, configured to generate a positive first order diffracted light and a negative first order diffracted light in different diffraction efficiencies. The asymmetrical diffraction grating includes a plurality of probing-phase shifters formed of semi-transparent material, disposed periodically on the mask substrate in parallel, and a plurality of opaque strips disposed on light-shielding faces of the probing-phase shifters. An asymmetrically recessed ridge implements each of the probing-phase shifters.