发明授权
- 专利标题: Split gate flash memory cell and fabrication method thereof
- 专利标题(中): 分离式闪存单元及其制造方法
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申请号: US11390144申请日: 2006-03-28
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公开(公告)号: US07485917B2公开(公告)日: 2009-02-03
- 发明人: Ching-Hung Fu , Hung-Kwei Liao , Chien-Chung Lu
- 申请人: Ching-Hung Fu , Hung-Kwei Liao , Chien-Chung Lu
- 申请人地址: TW Hsinchu
- 专利权人: Promos Technologies Inc.
- 当前专利权人: Promos Technologies Inc.
- 当前专利权人地址: TW Hsinchu
- 代理机构: Birch, Stewart, Kolasch & Birch, LLP
- 优先权: TW94137437A 20051026
- 主分类号: H01L29/788
- IPC分类号: H01L29/788
摘要:
A split gate flash memory cell comprising a semiconductor substrate having a first insulating layer thereon and a floating gate with a first width is disclosed. The cell further comprises a second insulating layer, a control gate and a cap on the floating gate in sequence. The cap layer, the control gate and the second insulating layer have a same second width less than the first width. The cell also comprises a third insulating layer over the semiconductor substrate, the sidewalls of the control gate, the second insulating layer, the floating gate, and the first insulating layer. In addition, an erase gate formed on the third insulating layer is provided.
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