发明授权
- 专利标题： Imprint lithography
- 专利标题（中）： 印刷光刻
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申请号： US11025605申请日： 2004-12-30
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公开(公告)号： US07490547B2公开(公告)日： 2009-02-17
- 发明人: Helmar Van Santen , Aleksey Yurievich Kolesnychenko
- 申请人： Helmar Van Santen , Aleksey Yurievich Kolesnychenko
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： B41M5/00
- IPC分类号： B41M5/00 ; G03G13/26
摘要：
An imprinting method is provided that, according to an embodiment, involves contacting an imprintable medium on a substrate with a template to define an imprint area in the medium, removing at least some of any imprintable medium present outside the imprint area, and separating the template from the medium.
公开/授权文献
- US20060150849A1 Imprint lithography 公开/授权日：2006-07-13
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