发明授权
US07491246B2 Capacitor electrodes produced with atomic layer deposition for use in implantable medical devices
有权
用原子层沉积法生产的用于可植入医疗器械的电容器电极
- 专利标题： Capacitor electrodes produced with atomic layer deposition for use in implantable medical devices
- 专利标题（中）： 用原子层沉积法生产的用于可植入医疗器械的电容器电极
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申请号： US11278307申请日： 2006-03-31
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公开(公告)号： US07491246B2公开(公告)日： 2009-02-17
- 发明人: Joachim Hossick-Schott , Naim S. Istephanous , John D. Norton , Anthony W. Rorvick , Richard W. A. Francis
- 申请人： Joachim Hossick-Schott , Naim S. Istephanous , John D. Norton , Anthony W. Rorvick , Richard W. A. Francis
- 申请人地址： US MN Minneapolis
- 专利权人： Medtronic, Inc.
- 当前专利权人： Medtronic, Inc.
- 当前专利权人地址： US MN Minneapolis
- 代理商 Carol F. Barry
- 主分类号： H01L21/00
- IPC分类号： H01L21/00
摘要：
An electrolytic capacitor cell for use in implantable medical devices and associated method for manufacture are provided. The capacitor cell includes an electrode substrate having a dielectric layer formed thereon by atomic layer deposition. In various embodiments, the dielectric layer includes an oxide of one or more valve metals.