Invention Grant
- Patent Title: Apparatus for abatement of by-products generated from deposition processes and cleaning of deposition chambers
- Patent Title (中): 用于减少由沉积工艺产生的副产物和清洁沉积室的装置
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Application No.: US11408678Application Date: 2006-04-21
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Publication No.: US07494628B2Publication Date: 2009-02-24
- Inventor: Himanshu Pokharna , Phong Le , Srinivas D. Nemani
- Applicant: Himanshu Pokharna , Phong Le , Srinivas D. Nemani
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Townsend & Townsend and Crew
- Main IPC: F01N3/08
- IPC: F01N3/08

Abstract:
Method and apparatus for abating F2 from by-products generated during cleaning of a processing chamber. F2 abatement is efficiently performed by directly injecting H2 in line with a foreline exiting the processing chamber. A tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber. A cooling jacket may be provided for cooling the tube, since the reaction between F2 and H2 is exothermic. A pressure monitoring arrangement may also be employed to insure that pressure within a hydrogen line, that feeds the injection of H2 into the tube, does not exceed a predetermined pressure value.
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