发明授权
US07495243B2 Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
有权
带电粒子束的写入方法，带电粒子束写入装置的支持装置，写入数据生成方法和程序记录的可读记录介质
- 专利标题： Writing method of charged particle beam, support apparatus of charged particle beam writing apparatus, writing data generating method and program-recorded readable recording medium
- 专利标题（中）： 带电粒子束的写入方法，带电粒子束写入装置的支持装置，写入数据生成方法和程序记录的可读记录介质
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申请号： US11682494申请日： 2007-03-06
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公开(公告)号： US07495243B2公开(公告)日： 2009-02-24
- 发明人: Takashi Kamikubo
- 申请人： Takashi Kamikubo
- 申请人地址： JP Numazu-shi
- 专利权人： NuFlare Technology, Inc.
- 当前专利权人： NuFlare Technology, Inc.
- 当前专利权人地址： JP Numazu-shi
- 代理机构： Oblon, Spivak, McClelland, Maier & Neustadt, P.C.
- 优先权： JP2006-062047 20060308
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; H01J3/14 ; H01J37/302
摘要：
A charged particle beam writing method includes inputting design pattern data, virtually dividing a writing area to be written with the design pattern data into a plurality of small areas in a mesh-like manner, calculating a pattern density in each of the plurality of small areas based on the design pattern data, calculating a resizing amount for each pattern density in a case of irradiating a charged particle beam at an isofocal dose, resizing a dimension of the design pattern data in each of the plurality of small areas, based on the resizing amount in each of the plurality of small areas, and writing a resized design pattern on a target workpiece with the isofocal dose corresponding to the pattern density which was calculated before the resizing in each of the plurality of small areas.