Invention Grant
US07495456B2 System and method of determining pulse properties of semiconductor device
有权
确定半导体器件的脉冲特性的系统和方法
- Patent Title: System and method of determining pulse properties of semiconductor device
- Patent Title (中): 确定半导体器件的脉冲特性的系统和方法
-
Application No.: US11361412Application Date: 2006-02-24
-
Publication No.: US07495456B2Publication Date: 2009-02-24
- Inventor: Hideki Horii , Yong-Ho Ha
- Applicant: Hideki Horii , Yong-Ho Ha
- Applicant Address: KR Suwon-si, Gyeonggi-do
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: KR Suwon-si, Gyeonggi-do
- Agency: Marger Johnson & McCollom, P.C.
- Priority: KR10-2005-0043812 20050524
- Main IPC: G01R27/08
- IPC: G01R27/08

Abstract:
Provided are a system and method of determining pulse properties of a semiconductor device. An embodiment of the system includes at least one pair of first and second probes electrically contacting terminals of the semiconductor resistance device, a pulse generator connected to the first probe and outputting pulse signals, an oscilloscope having at least one pair of first and second channels, wherein the pulse electric signal is supplied to the first channel and the first probe and the second channel is connected to the second probe. The oscilloscope calculates a pulse current flowing in terminals of the semiconductor resistance device using the second channel and determines a dynamic resistance of the semiconductor resistance device using the first and second channels.
Public/Granted literature
- US20060267573A1 System and method of determining pulse properties of semiconductor device Public/Granted day:2006-11-30
Information query