发明授权
US07499767B2 Methods and apparatus for positioning a substrate relative to a support stage
失效
用于将衬底相对于支撑台定位的方法和装置
- 专利标题： Methods and apparatus for positioning a substrate relative to a support stage
- 专利标题（中）： 用于将衬底相对于支撑台定位的方法和装置
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申请号： US11562309申请日： 2006-11-21
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公开(公告)号： US07499767B2公开(公告)日： 2009-03-03
- 发明人: Shinichi Kurita , Emanuel Beer
- 申请人： Shinichi Kurita , Emanuel Beer
- 申请人地址： US CA Santa Clara
- 专利权人： Applied Materials, Inc.
- 当前专利权人： Applied Materials, Inc.
- 当前专利权人地址： US CA Santa Clara
- 代理机构： Dugan & Dugan
- 主分类号： G06F7/00
- IPC分类号： G06F7/00
摘要：
In a first aspect, a substrate positioning system includes a plurality of pushers arranged in a spaced relation about a stage adapted to support a substrate. Each pusher is adapted to assume a retracted position so as to permit the substrate to be loaded onto and unloaded from the stage, extend toward an edge of the substrate that is supported by the stage, contact the edge of the substrate, and continue extending so as to cause the substrate to move relative to the stage until the substrate is calibrated to the stage. Numerous other aspects are provided.