发明授权
- 专利标题: Twin-ONO-type SONOS memory
- 专利标题(中): 双ONO型SONOS存储器
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申请号: US11296397申请日: 2005-12-08
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公开(公告)号: US07511334B2公开(公告)日: 2009-03-31
- 发明人: Yong-kyu Lee , Jeong-uk Han , Sung-taeg Kang , Jong-duk Lee , Byung-gook Park
- 申请人: Yong-kyu Lee , Jeong-uk Han , Sung-taeg Kang , Jong-duk Lee , Byung-gook Park
- 申请人地址: KR Suwon-si, Gyeonggi-do
- 专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人: Samsung Electronics Co., Ltd.
- 当前专利权人地址: KR Suwon-si, Gyeonggi-do
- 代理机构: Lee & Morse, P.C.
- 优先权: KR03-20444 20030401
- 主分类号: H01L27/088
- IPC分类号: H01L27/088 ; H01L21/336
摘要:
A twin-ONO-type SONOS memory includes a semiconductor substrate having a source region, a drain region and a channel region between the source and drain regions, twin silicon oxide-silicon nitride-silicon oxide (ONO) dielectric layers, a first ONO dielectric layer being on the channel region and the source region and as second ONO dielectric layer being on the channel region and the drain region, and a control gate on the channel region, between the twin ONO dielectric layers, the twin ONO dielectric layers extending along at least lower lateral sides of the control gate adjacent the channel region, wherein the twin ONO dielectric layers extend towards the source and drain regions further than the control gate.
公开/授权文献
- US20060086953A1 Twin-ONO-type SONOS memory 公开/授权日:2006-04-27