Invention Grant
- Patent Title: Method of making an interposer
- Patent Title (中): 制作插件的方法
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Application No.: US11902976Application Date: 2007-09-27
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Publication No.: US07511518B2Publication Date: 2009-03-31
- Inventor: Frank D. Egitto , How T. Lin
- Applicant: Frank D. Egitto , How T. Lin
- Applicant Address: US NY Endicott
- Assignee: Endicott Interconnect Technologies, Inc.
- Current Assignee: Endicott Interconnect Technologies, Inc.
- Current Assignee Address: US NY Endicott
- Agency: Hinman, Howard & Kattell
- Agent Mark Levy; Lawrence Fraley
- Main IPC: G01R31/02
- IPC: G01R31/02

Abstract:
A method of making an interposer in which at least two dielectric layers are bonded to each other to sandwich a plurality of conductors there-between. The conductors each electrically couple a respective pair of opposed electrical contacts which are formed within and protrude from openings which are also formed within the dielectric layers as part of this method. The resulting interposer is ideally suited for use as part of a test apparatus to interconnect highly dense patterns of solder ball contacts of a semiconductor chip to lesser dense arrays of contacts on the apparatus's printed circuit board.
Public/Granted literature
- US20080020566A1 Method of making an interposer Public/Granted day:2008-01-24
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