发明授权
US07514202B2 Thermal acid generator, resist undercoat material and patterning process
有权
热酸发生器，抗蚀底漆材料和图案化工艺
- 专利标题： Thermal acid generator, resist undercoat material and patterning process
- 专利标题（中）： 热酸发生器，抗蚀底漆材料和图案化工艺
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申请号： US11797948申请日： 2007-05-09
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公开(公告)号： US07514202B2公开(公告)日： 2009-04-07
- 发明人: Youichi Ohsawa , Takeru Watanabe , Jun Hatakeyama
- 申请人： Youichi Ohsawa , Takeru Watanabe , Jun Hatakeyama
- 申请人地址： JP Tokyo
- 专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人： Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址： JP Tokyo
- 代理机构： Westerman, Hattori, Daniels & Adrian, LLP.
- 优先权： JP2006-135169 20060515
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03F7/30 ; C07C309/06
摘要：
A thermal acid generator of generating an acid on heating above 100° C. has formula: CF3CH(OCOR)CF2SO3−(R1)4N+ wherein R is alkyl or aryl, R1 is hydrogen, alkyl, alkenyl, oxoalkyl, aryl, aralkyl or aryloxoalkyl, or R1 may bond together to form a ring with N. The sulfonic acid generated possesses an ester site within molecule so that less bulky acyl groups to bulky groups may be incorporated therein. The thermal acid generator provides a sufficient acid strength, is less volatile due to a high molecular weight, and ensures film formation. Upon disposal of used resist liquid, it may be converted into low accumulative compounds.