发明授权
- 专利标题: Manufacturing method of electro line for liquid crystal display device
- 专利标题(中): 液晶显示装置电线制造方法
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申请号: US10315151申请日: 2002-12-10
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公开(公告)号: US07521366B2公开(公告)日: 2009-04-21
- 发明人: Oh-Nam Kwon , Kyoung-Mook Lee , Heung-Lyul Cho , Seung-Hee Nam , Cyoo-Chul Jo
- 申请人: Oh-Nam Kwon , Kyoung-Mook Lee , Heung-Lyul Cho , Seung-Hee Nam , Cyoo-Chul Jo
- 申请人地址: KR Seoul
- 专利权人: LG Display Co., Ltd.
- 当前专利权人: LG Display Co., Ltd.
- 当前专利权人地址: KR Seoul
- 代理机构: McKenna Long & Aldridge LLP
- 优先权: KR10-2001-0078557 20011212; KR10-2001-0078558 20011212
- 主分类号: H01L21/302
- IPC分类号: H01L21/302
摘要:
A manufacturing method of an electro line for a liquid crystal display device includes depositing a barrier layer made of a conducting material on a substrate, depositing a copper layer (Cu) on the barrier layer, wet-etching the Cu layer using a first etchant, and dry-etching the barrier layer using a second etchant using the wet-etched Cu layer as an etch mask.
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