发明授权
- 专利标题: Temperature stabilization for substrate processing
- 专利标题(中): 基板加工温度稳定
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申请号: US11532748申请日: 2006-09-18
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公开(公告)号: US07528349B1公开(公告)日: 2009-05-05
- 发明人: Yehiel Gotkis , Arik Donde , Vincenzo Lordi
- 申请人: Yehiel Gotkis , Arik Donde , Vincenzo Lordi
- 申请人地址: US CA Milpitas
- 专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人: KLA-Tencor Technologies Corporation
- 当前专利权人地址: US CA Milpitas
- 代理机构: JDI Patent
- 代理商 Joshua D. Isenberg
- 主分类号: H05B3/68
- IPC分类号: H05B3/68 ; F26B19/00
摘要:
A temperature stabilization system, method, composition of matter and substrate processing system are disclosed. A heat absorbing material is disposed in thermal contact with a substrate. The heat absorbing material is characterized by a solid-liquid phase transition temperature that is in a desired temperature range for material processing the substrate. When the substrate is subjected to material processing that results in heat transfer into or out of the substrate the solid-liquid phase transition of the heat absorbing material stabilizes the temperature of the substrate.
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