发明授权
US07528935B2 Lithographic apparatus, device manufacturing method, and device manufactured thereby
有权
平版印刷设备,器件制造方法和由此制造的器件
- 专利标题: Lithographic apparatus, device manufacturing method, and device manufactured thereby
- 专利标题(中): 平版印刷设备,器件制造方法和由此制造的器件
-
申请号: US11312654申请日: 2005-12-21
-
公开(公告)号: US07528935B2公开(公告)日: 2009-05-05
- 发明人: Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
- 申请人: Koen Jacobus Johannes Maria Zaal , Tjarko Adriaan Rudolf Van Empel , Hendricus Johannes Maria Meijer , Joost Jeroen Ottens , Marco Le Kluse , Jan Hopman
- 申请人地址: NL Veldhoven
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 当前专利权人地址: NL Veldhoven
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 优先权: EP03077318 20030723
- 主分类号: G03B27/58
- IPC分类号: G03B27/58 ; G03B27/62 ; H01T23/00
摘要:
A lithographic projection apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and an article holder. The article holder includes a plurality of protrusions arranged to provide a substantially flat plane of support for supporting an article to be placed in a beam path of the beam of radiation. The protrusions are generally spaced apart equidistantly at a first distance. The article holder also includes a pair of electrodes for clamping the article to the holder. The electrodes are disposed in substantially the same plane above or below the protrusions, and are spaced apart from one another by a gap. Neighboring protrusions within the plurality of protrusions that are located on opposite sides of the gap are spaced apart by a second distance that is greater than the first distance.