发明授权
- 专利标题: Optical element, optical system and methods of manufacturing the same as well as optical equipment
- 专利标题(中): 光学元件,光学系统及其制造方法以及光学设备
-
申请号: US11361353申请日: 2006-02-24
-
公开(公告)号: US07529044B2公开(公告)日: 2009-05-05
- 发明人: Mitsuaki Matsumoto , Keiichi Kuramoto , Nobuhiko Hayashi , Hitoshi Hirano
- 申请人: Mitsuaki Matsumoto , Keiichi Kuramoto , Nobuhiko Hayashi , Hitoshi Hirano
- 申请人地址: JP Moriguchi, Osaka
- 专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人: Sanyo Electric Co., Ltd.
- 当前专利权人地址: JP Moriguchi, Osaka
- 代理机构: NDQ&M Watchstone LLP
- 代理商 Vincent M. DeLuca
- 优先权: JP2005-051590 20050225; JP2006-023285 20060131
- 主分类号: G02B7/02
- IPC分类号: G02B7/02
摘要:
An optical element has a marker provided in the form of an optical fault at a predetermined location in the effective optical area thereof for positioning. The optical fault is a marker 1a provided at a specific location on the effective optical area of the optical element 1 preferably in the form of a projection, a recess, a tinted portion, a different refraction portion, an air bubble, or a particle on or in the optical element 1. More preferably, the marker 1a is located at or around the center of the optical element 1 and its area size is not greater than 0.4% of the effective optical area of the lens 1.
公开/授权文献
信息查询
IPC分类:
G | 物理 |
G02 | 光学 |
G02B | 光学元件、系统或仪器 |
G02B7/00 | 光学元件的安装、调整装置或不漏光连接 |
G02B7/02 | .用于透镜 |