发明授权
US07531426B2 Approach to high temperature wafer processing 有权
接近高温晶圆加工

Approach to high temperature wafer processing
摘要:
At temperatures near, and above, 385° C., gold can diffuse into silicon and into some contact materials. Gold, however, is an excellent material because it is corrosion resistant, electrically conductive, and highly reliable. Using an adhesion layer and removing gold from the contact area above and around a contact allows a Micro-Electro-Mechanical Systems device or semiconductor to be subjected to temperatures above 385° C. without risking gold diffusion. Removing the risk of gold diffusion allows further elevated temperature processing. Bonding a device substrate to a carrier substrate can be an elevated temperature process.
公开/授权文献
信息查询
0/0