发明授权
- 专利标题: Approach to high temperature wafer processing
- 专利标题(中): 接近高温晶圆加工
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申请号: US11208178申请日: 2005-08-19
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公开(公告)号: US07531426B2公开(公告)日: 2009-05-12
- 发明人: Richard A. Davis
- 申请人: Richard A. Davis
- 申请人地址: US NJ Morristown
- 专利权人: Honeywell International Inc.
- 当前专利权人: Honeywell International Inc.
- 当前专利权人地址: US NJ Morristown
- 代理商 Richard H. Krukar; Kermit D. Lopez; Luis M. Ortiz
- 主分类号: H01L21/46
- IPC分类号: H01L21/46 ; H01L21/30
摘要:
At temperatures near, and above, 385° C., gold can diffuse into silicon and into some contact materials. Gold, however, is an excellent material because it is corrosion resistant, electrically conductive, and highly reliable. Using an adhesion layer and removing gold from the contact area above and around a contact allows a Micro-Electro-Mechanical Systems device or semiconductor to be subjected to temperatures above 385° C. without risking gold diffusion. Removing the risk of gold diffusion allows further elevated temperature processing. Bonding a device substrate to a carrier substrate can be an elevated temperature process.
公开/授权文献
- US20070042592A1 Novel approach to high temperature wafer processing 公开/授权日:2007-02-22
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