发明授权
- 专利标题： Apparatus, method for supporting and/or thermally conditioning a substrate, a support table, and a chuck
- 专利标题（中）： 用于支撑和/或热调理基底，支撑台和卡盘的装置，方法
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申请号： US10970658申请日： 2004-10-22
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公开(公告)号： US07532310B2公开(公告)日： 2009-05-12
- 发明人: Jeroen Johannes Sophia Maria Mertens , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens , Edwin Van Gompel
- 申请人： Jeroen Johannes Sophia Maria Mertens , Aschwin Lodewijk Hendricus Johannes Van Meer , Joost Jeroen Ottens , Edwin Van Gompel
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 代理机构： Pillsbury Winthrop Shaw Pittman LLP
- 主分类号： G03B27/58
- IPC分类号： G03B27/58 ; G03B27/62
摘要：
An apparatus includes a support table for supporting a substrate. The support table includes a plurality of support protrusions that contact the substrate during use for supporting the substrate. The support table includes a plurality of heat transfer protrusions that extend towards the substrate during use without contacting the substrate when the substrate is supported by the support protrusions. Gas-containing heat exchanging gaps for exchanging heat with the substrate extend between the heat transfer protrusions and the substrate.