发明授权
- 专利标题: Manufacturing method of display device
- 专利标题(中): 显示装置的制造方法
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申请号: US11723794申请日: 2007-03-22
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公开(公告)号: US07535535B2公开(公告)日: 2009-05-19
- 发明人: Tomoyuki Iwabuchi
- 申请人: Tomoyuki Iwabuchi
- 申请人地址: JP Kanagawa-Ken
- 专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人: Semiconductor Energy Laboratory Co., Ltd.
- 当前专利权人地址: JP Kanagawa-Ken
- 代理机构: Nixon Peabody LLP
- 代理商 Jeffrey L. Costellia; Marc W. Butler
- 优先权: JP2002-379496 20021227
- 主分类号: G02F1/1345
- IPC分类号: G02F1/1345
摘要:
A manufacturing method of a display device, which prevents electrostatic breakdown of the display device both before and after a circuit test without reducing the productivity in forming a plurality of display devices on a substrate to be processed by a step-and-repeat exposing method. A wiring pattern group led out from signal input terminals of the display devices to the edge of the substrate to be processed is efficiently formed by exposing to light through a repetitive pattern integrated with a display device pattern. Depending on the states of the wiring pattern group as to contact or non-contact with a detachable and conductive component, the signal input terminals of the display devices can be easily switched between in a short circuited state and a non-short circuited state. Accordingly, both the measure against electrostatic breakdown and the circuit test are achieved in the display devices on the substrate to be processed.
公开/授权文献
- US20070171349A1 Manufacturing method of display device 公开/授权日:2007-07-26