发明授权
- 专利标题: Cutting method of fabric material
- 专利标题(中): 织物材料切割方法
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申请号: US11000985申请日: 2004-12-02
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公开(公告)号: US07536937B2公开(公告)日: 2009-05-26
- 发明人: Hidetoshi Kawasaki , Ken Shimizu
- 申请人: Hidetoshi Kawasaki , Ken Shimizu
- 申请人地址: JP Tokyo
- 专利权人: Fujifilm Corporation
- 当前专利权人: Fujifilm Corporation
- 当前专利权人地址: JP Tokyo
- 代理机构: Birch, Stewart, Kolasch and Birch, LLP
- 优先权: JP2003-407695 20031205
- 主分类号: B26D7/10
- IPC分类号: B26D7/10
摘要:
A fabric material has a base fabric, a pile layer on a surface of the base fabric, and an adhesive layer of a hot-melt adhesive on another surface of the base fabric. The adhesive layer contains a wax whose melting point Tm1 is from 20° C. to 50° C. lower than the melting point Tm2 of the base polymer. The fabric material is heated by a heating device to at least (Tm1+5)° C. and (Tm2−5)° C., and then cut by a ultrasonic wave cutter 23. Thus the fabric material can be cut without generating the chaffs of the adhesive agent and the fiber offscums. As a result, the pollution is not made in the cutting process, and the cutting of the fabric material is made continuously and stably. Without the adhesion of the chaffs, the teremp which has a good surface formed by the cutting.
公开/授权文献
- US20050120842A1 Cutting method of fabric material 公开/授权日:2005-06-09
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