发明授权
- 专利标题: Process and adsorbent for hydrogen purification
- 专利标题(中): 用于氢气净化的工艺和吸附剂
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申请号: US10540506申请日: 2003-12-22
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公开(公告)号: US07537742B2公开(公告)日: 2009-05-26
- 发明人: Mohamed Safdar Allie Baksh , Mark William Ackley , Frank Notaro
- 申请人: Mohamed Safdar Allie Baksh , Mark William Ackley , Frank Notaro
- 申请人地址: US CT Danbury
- 专利权人: Praxair Technology, Inc.
- 当前专利权人: Praxair Technology, Inc.
- 当前专利权人地址: US CT Danbury
- 代理商 Salvatore P. Pace
- 国际申请: PCT/US03/40797 WO 20031222
- 国际公布: WO2004/058630 WO 20040715
- 主分类号: B01D53/04
- IPC分类号: B01D53/04
摘要:
This invention discloses an optimum set of adsorbents for use in H2-PSA processes. Each adsorbent bed is divided into four regions; Region 1 contains adsorbent for removing water; Region 2 contains a mixture of strong and weak adsorbents to remove bulk impurities like CO2; Region 3 contains a high bulk density (>38 lbm/ft3) adsorbent to remove remaining CO2; and most of CH4 and CO present in H2 containing feed mixtures; and Region 4 contains adsorbent having high Henry's law constants for the final cleanup of N2 and residual impurities to produce hydrogen at the desired high purity.
公开/授权文献
- US20060254425A1 Process and apparatus for hydrogen purification 公开/授权日:2006-11-16
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