Invention Grant
US07544591B2 Method of creating isolated electrodes in a nanowire-based device
有权
在基于纳米线的器件中产生隔离电极的方法
- Patent Title: Method of creating isolated electrodes in a nanowire-based device
- Patent Title (中): 在基于纳米线的器件中产生隔离电极的方法
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Application No.: US11624682Application Date: 2007-01-18
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Publication No.: US07544591B2Publication Date: 2009-06-09
- Inventor: Shashank Sharma , Theodore I Kamins
- Applicant: Shashank Sharma , Theodore I Kamins
- Applicant Address: US TX Houston
- Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee: Hewlett-Packard Development Company, L.P.
- Current Assignee Address: US TX Houston
- Main IPC: H01L21/20
- IPC: H01L21/20 ; H01L21/36

Abstract:
Methods of creating isolated electrodes and integrating a nanowire therebetween each employ lateral epitaxial overgrowth of a semiconductor material on a semiconductor layer to form isolated electrodes having the same crystal orientation. The methods include selective epitaxial growth of a semiconductor feature through a window in an insulating film on the semiconductor layer. A vertical stem is in contact with the semiconductor layer through the window and a ledge is a lateral epitaxial overgrowth of the vertical stem on the insulating film. The methods further include creating a pair of isolated electrodes from the semiconductor feature and the semiconductor layer. A nanowire-based device includes the pair of isolated electrodes and a nanowire bridging between respective surfaces of the isolated electrodes of the pair.
Public/Granted literature
- US20080173971A1 ELECTRODE ISOLATION METHOD AND NANOWIRE-BASED DEVICE HAVING ISOLATED ELECTRODE PAIR Public/Granted day:2008-07-24
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