发明授权
- 专利标题： Method for reducing PSA tilt through standoff relocation
- 专利标题（中）： 通过支架移位减少PSA倾斜的方法
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申请号： US11152947申请日： 2005-06-15
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公开(公告)号： US07545605B2公开(公告)日： 2009-06-09
- 发明人: Shinobu Hagiya , Shigeo Nakamura , Wing Chun Shum
- 申请人： Shinobu Hagiya , Shigeo Nakamura , Wing Chun Shum
- 申请人地址： NL Amsterdam
- 专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人： Hitachi Global Storage Technologies Netherlands B.V.
- 当前专利权人地址： NL Amsterdam
- 主分类号： G11B5/60
- IPC分类号： G11B5/60
摘要：
A head assembly for a data storage device. The head assembly has a suspension. The head assembly also includes a contact pad coupled to the suspension. The head assembly also includes a slider. The slider is coupled to the suspension at the slider mounting point. The slider mounting point is at least partially bounded by polyimide standoffs. The polyimide standoff closest to the contact pad is positioned to reduce the effect of the solder shrinkage moment.
公开/授权文献
- US20060285251A1 Method for reducing PSA tilt through standoff relocation 公开/授权日：2006-12-21
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