发明授权
US07547560B2 Defect identification system and method for repairing killer defects in semiconductor devices 失效
缺陷识别系统和修复半导体器件杀伤性缺陷的方法

Defect identification system and method for repairing killer defects in semiconductor devices
摘要:
A method for improving semiconductor yield by in-line repair of defects during manufacturing comprises inspecting dies on a wafer after a selected layer is formed on the dies, identifying defects in each of the dies, classifying the identified defects as killer or non-critical, for each killer defect determining an action to correct the defect, repairing the defect and returning the wafer to a next process step. Also disclosed is a method for determining an efficient repair process by dividing the die into a grid and using analysis of the grid to find a least invasive repair.
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