发明授权
US07547956B2 Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same
有权
用于电路的低通滤波器的厚氧化物P栅极NMOS电容器及其制造方法
- 专利标题: Thick oxide P-gate NMOS capacitor for use in a low-pass filter of a circuit and method of making same
- 专利标题(中): 用于电路的低通滤波器的厚氧化物P栅极NMOS电容器及其制造方法
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申请号: US10975090申请日: 2004-10-28
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公开(公告)号: US07547956B2公开(公告)日: 2009-06-16
- 发明人: Derek Tam , Jasmine Cheng , Jungwoo Song , Takayuki Hayashi
- 申请人: Derek Tam , Jasmine Cheng , Jungwoo Song , Takayuki Hayashi
- 申请人地址: US CA Irvine
- 专利权人: Broadcom Corporation
- 当前专利权人: Broadcom Corporation
- 当前专利权人地址: US CA Irvine
- 代理机构: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- 主分类号: H01L23/58
- IPC分类号: H01L23/58
摘要:
A circuit with dielectric thicknesses is presented that includes a low-pass filter including one or more semiconductor devices having a thick gate oxide layer, while further semiconductor devices of the circuit have thin gate oxide layers. The low-pass filter semiconductor device includes an N-type substrate, a P-type region formed on the N-type substrate, a thick gate oxide layer formed over the P-type region, a P+ gate electrode formed over the thick gate oxide layer and coupled to a first voltage supply line, and P+ pick-up terminals formed in the P-type region adjacent the gate electrode and coupled to a second voltage supply line. The low-pass filter semiconductor device acts as a capacitor, whereby a gate-to-substrate voltage is maintained at less than zero volts to maintain a stable control voltage for the circuit.
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